|B-Phot Authors||Jurgen Van Erps, Hugo Thienpont|
J. Van Erps, B. Volckaerts, P. Vynck, C. Debaes, and H. Thienpont, “Fabrication of multimode polymer waveguides with integrated micro-mirrors using Deep Lithography,” presented at the 10th Micro Optics Conference (MOC’04), 2004, p. L-21.
|Abstract||Multimode polymeric waveguides and 45° micromirrors have been fabricated using deep X-ray lithography. Polymethylmetacrylate was used as a core layer and silica and silicone elastomer as a lower and upper cladding layer. respectively. The propagation loss of the waveguide was 0.54 dB/cm at 830 nm and the loss of micromirrors was less than 0.43 dB at the wavelength. The X-ray lithography technique offers the controllabililty of mirror angles to 45° and -45° so that it gives flexibility to the system architecture of optical interconnections.|
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